Title:
基材上に構造を形成する方法
Document Type and Number:
Japanese Patent JP7048611
Kind Code:
B2
Abstract:
A method of forming a layer on a substrate is provided by providing the substrate with a hardmask material. The hardmask material is infiltrated with infiltration material during N infiltration cycles by: a) providing a first precursor to the hardmask material on the substrate in the reaction chamber for a first period Tl; b) removing a portion of the first precursor for a second period T2; and, c) providing a second precursor to the hardmask material on the substrate for a third period T3, allowing the first and second precursor to react with each other forming the infiltration material.
Inventors:
Kunapuen, Berner
Mays, Jan Billem
Young Brute, Belt
Kahel, Kshistov Kamil
Pierre, Dieter
De Roust, David Kurt
Mays, Jan Billem
Young Brute, Belt
Kahel, Kshistov Kamil
Pierre, Dieter
De Roust, David Kurt
Application Number:
JP2019531445A
Publication Date:
April 05, 2022
Filing Date:
December 08, 2017
Export Citation:
Assignee:
AS M IP Holding Besloten Fennaught Shap
International Classes:
H01L21/027; H01L21/3065; H01L21/314
Domestic Patent References:
| JP2015034987A | ||||
| JP2015179843A | ||||
| JP2009108402A | ||||
| JP2007208042A | ||||
| JP2014532289A | ||||
| JP2015516686A |
Attorney, Agent or Firm:
Shinjiro Ono
Osamu Yamamoto
Toru Miyamae
Motoharu Nakanishi
Hiroaki Noya
Osamu Yamamoto
Toru Miyamae
Motoharu Nakanishi
Hiroaki Noya