Title:
無水塩化水素ガスを精製するための改良された方法
Document Type and Number:
Japanese Patent JP2009536913
Kind Code:
A
Abstract:
The present invention relates to a process for purifying anhydrous hydrogen chloride gas ("aHCl"), and preferably the anhydrous hydrogen chloride gas recovered from an isocyanate production process. In the process of the present invention, the content of chlorinated organics may be reduced from up to 1000 ppm by volume to below 10 ppb by volume levels. Generally, the process of the invention allows for chlorinated organic levels to be reduced to from 1 to 100 ppb, rendering the treated hydrogen chloride gas usable in a catalytic oxychlorination process or a Deacon process. The treated gas is also suitable for absorption in water or dilute hydrochloric acid.
Inventors:
Eric F. Boonstra
John M. Tip
Linee M Bande Kemp
Anke Hielscher
Caspar Harenberger
John M. Tip
Linee M Bande Kemp
Anke Hielscher
Caspar Harenberger
Application Number:
JP2009508195A
Publication Date:
October 22, 2009
Filing Date:
April 30, 2007
Export Citation:
Assignee:
Bayer MaterialScience AG
Bayer MaterialScience LLC
Bayer MaterialScience LLC
International Classes:
C01B7/01
Domestic Patent References:
| JP2006290649A | 2006-10-26 | |||
| JP2006290757A | 2006-10-26 | |||
| JPS6350303A | 1988-03-03 | |||
| JPS61209903A | 1986-09-18 | |||
| JPH0222101A | 1990-01-25 | |||
| JP2005523226A | 2005-08-04 | |||
| JP2006510695A | 2006-03-30 | |||
| JP2006290649A | 2006-10-26 | |||
| JP2006290757A | 2006-10-26 | |||
| JPS6350303A | 1988-03-03 | |||
| JPS61209903A | 1986-09-18 | |||
| JPH0222101A | 1990-01-25 | |||
| JP2005523226A | 2005-08-04 | |||
| JP2006510695A | 2006-03-30 |
Attorney, Agent or Firm:
Samejima Mutsumi
Kyousei Tamura
Genban Sanae
Kyousei Tamura
Genban Sanae