To provide an imprint method by which an irregular pattern is formed in a short period of time without causing deformation and omission of rugged pattern.
Stamper pressing processing in which a stamper 20 is pressed to a resin layer 14 formed by applying resin material onto a surface of a base material (disk type base material 11, magnetic layer 12, and metal layer 13), in a state in which the resin layer 14 is heated to the prescribed temperature, and stamper peeling-off processing in which the stamper 20 is peeled off from the resin layer 14 while keeping either a state in which the resin layer is heated and a state in which the heated resin layer 14 is kept warm, are performed in this order, ruggedness of the rugged pattern 33 in the stamper 20 is transferred to the resin layer 14, and the rugged pattern is formed on the base material.
HATTORI KAZUHIRO
SOENO KEIICHI
TAKAI MITSURU
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