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Patent Searching and Data


Title:
MANUFACTURE OF POLISHING FLUID FOR ELECTROLESS NICKEL PLATING FILM
Document Type and Number:
Japanese Patent JP2964720
Kind Code:
B2
Abstract:

PURPOSE: To manufacture a polishing fluid which is excellent in the dispersion stability of alumina, has a good polishing effect even after long-term, and is suitable for polishing an electroless nickel plating film, especially an Ni-P film, on, e.g. a hard disc.
CONSTITUTION: A polishing fluid for an electroless nickel plating film, is manufactured by dispersing alumina in water and adjusting the pH to 2.8 or lower with sulfuric acid to give an alumina dispersion, adding colloidal silica to the dispersion, and then adding nickel carbonate thereto to adjust the pH to 5 to 7.


Inventors:
KAWAKAMI HIROSHI
KADOTA KOJI
MATSUMOTO HIROSHI
SHIKITA NOBUZO
Application Number:
JP1991000224943
Publication Date:
October 18, 1999
Filing Date:
August 09, 1991
Export Citation:
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Assignee:
UEMURA KOGYO KK
International Classes:
B24B37/00; C09K3/14; C23C18/32; (IPC1-7): C09K3/14; B24B37/00
Attorney, Agent or Firm:
小島 隆司