Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MANUFACTURE OF STAMPER
Document Type and Number:
Japanese Patent JPH05205321
Kind Code:
A
Abstract:

PURPOSE: To prevent peeling defects by performing an electroforming working, after a Ni thin film having tensile internal stress is formed on a master disk.

CONSTITUTION: After a photoresist mask 2a is applied on a flat glass substrate 1, for example a sputtering etching is carried out. The resist mask is burnt to ash by O2 plasma and the master disk 1a is made. By using Ar in a vacuumed room at 8×10-3Torr vacuum, a 200-350 Ni thin film 3 is sputtered by 1KW electric power and the ≥7×10-9 dyne/cm2 Ni thin film in tensile internal stress is formed. Thereafter, using a specific electrolytic solution, a nearly 300μm electroformed Ni film in thickness is deposited and the Ni film 3 is stripped from the master disk 1a to prepare the stamper 3.


Inventors:
ISONO HITOSHI
TAKEMORI HIROTOSHI
INUI TETSUYA
OTA KENJI
Application Number:
JP1376892A
Publication Date:
August 13, 1993
Filing Date:
January 29, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHARP KK
International Classes:
B29C33/38; B29C45/26; G11B7/26; B29L17/00; (IPC1-7): B29C33/38; B29C45/26; B29L17/00; G11B7/26
Attorney, Agent or Firm:
Umeda Masaru