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Title:
MANUFACTURING METHOD FOR OPTICAL SYSTEM, AND EXPOSURE DEVICE EQUIPPED WITH OPTICAL SYSTEM PRODUCED BY THE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2002286989
Kind Code:
A
Abstract:

To manufacture a projection optical system where aberration is restrained to be very small, for example, the wave aberration of a lens is ≤10mλ even when the individual lenses have refractive index distribution or the error of surface shape to some extent.

This method includes a refractive index distribution measuring stage (S11) in which the refractive index distribution in optical material for forming the lens is measured, a surface shape measuring stage (S13) in which the surface shape of the lens is measured, and a correction film forming stage (S14) in which the optical error (wave surface error) of the lens is obtained based on the measured result by the refractive index distribution measuring stage and the measured result by the surface shape measuring stage so as to form a thin film (reflection preventing film) having specified thickness distribution on the surface of the lens based on the calculated result.


Inventors:
TANIMOTO SHOICHI
Application Number:
JP2001000089242
Publication Date:
October 03, 2002
Filing Date:
March 27, 2001
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G01J9/02; G01M11/00; G01M11/02; G02B1/11; G02B1/115; G02B7/02; G02B13/00; G02B13/24; G03F7/20; H01L21/027; (IPC1-7): G02B7/02; G01J9/02; G01M11/00; G01M11/02; G02B1/11; G02B13/00; G02B13/24; G03F7/20; H01L21/027
Domestic Patent References:
JP2000097666A2000-04-07
JP2000047103A2000-02-18
Attorney, Agent or Firm:
Takao Yamaguchi



 
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