密着性の優れた表面被覆の製造方法

Japanese Patent JP4755758

B2

The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate that comprises, in a first stepa) subjecting the inorganic or organic substrate to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, then discontinuing the radiation or discharge; in a further stepb) under vacuum or at normal pressure, applying one or more photoinitiators containing at least one ethylenically unsaturated group to the inorganic or organic substrate, and allowing reaction with the free-radical sites formed there; andc1) coating the substrate so precoated with photoinitiator with a composition comprising at least one ethylenically unsaturated monomer or oligomer, and curing the coating by means of UV/VIS radiation orc2) depositing a metal, semi-metal oxide or metal oxide from the gaseous phase, in the presence of UV light, on the substrate so precoated with photoinitiator. The invention relates also to the use of photoinitiators having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.

Michael, bower
Koehler, Manfred
Kuntz, Martin
Mizef, Ryubomir

JP2000578122A

August 24, 2011

October 20, 1999

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Ciba Holding Inc.

B05D3/04; B05D3/06; C08J7/18; B05D3/10; B05D3/14; B05D5/00; B05D7/24; B32B9/00; B32B15/08; B32B27/18; B32B27/30; C23C14/02; D06M11/00; D06M11/83; D06M14/26

JPH09176349A	1997-07-08
JPH0977891A	1997-03-25
JPH10101827A	1998-04-21

WO1996020796A1

1996-07-11

Hajime Tsukuni
Fumio Shinoda

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