To provide a mask for forming a high-definition thin film pattern and capable of suppressing damage caused by impurities to the thin film pattern.
A mask 1 which contacts and installed to a substrate is provided for forming multiple types of thin film patterns in certain forms. The mask 1 comprises: a resin film 2 which transmits visible light; and a holding member 3 for holding the resin film 2, which is formed by a plate body with a through-opening 5 having a shape larger than one thin film pattern corresponding to a formed region of the one thin film pattern among formed regions of the multiple types of thin film patterns predefined on the substrate. The film 2 includes an opening pattern 4 having the same shape as the one thin film pattern in the opening 5 of the holding member 3 corresponding to the formed region of the one thin film pattern on the substrate, and has a recess 6 having the same shape as other thin film pattern on a contact surface side of the substrate corresponding to a formed region of the other thin film pattern.
| JPH1050478A | 1998-02-20 | |||
| JP2000096211A | 2000-04-04 | |||
| JP2008208426A | 2008-09-11 | |||
| JP2010065297A | 2010-03-25 | |||
| JP2010116579A | 2010-05-27 | |||
| JP2009520110A | 2009-05-21 |
| WO1997034447A1 | 1997-09-18 |
Haruyuki Nishiyama
Shoichi Okuyama
Moriaki Ogawa
Kunio Araki
Taiki Kaji
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