Title:
計測システムクラスター
Document Type and Number:
Japanese Patent JP4348412
Kind Code:
B2
Abstract:
Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
Inventors:
Hasan, Talat
Application Number:
JP2002585932A
Publication Date:
October 21, 2009
Filing Date:
April 24, 2002
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G01N21/956; H01L21/02; G01N21/00; G01N21/95; H01L21/00; H01L21/66; G01N21/21; G01N21/47
Domestic Patent References:
| JP2000260674A | ||||
| JP11317431A | ||||
| JP11283894A | ||||
| JP10284359A | ||||
| JP10107112A | ||||
| JP9237812A | ||||
| JP9213756A | ||||
| JP8250384A | ||||
| JP6244261A |
Foreign References:
| WO2000079355A1 |