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Patent Searching and Data


Title:
METHOD FOR DIMINISHING GAS RELEASED FROM MATERIAL FOR VACUUM DEPOSITION
Document Type and Number:
Japanese Patent JP2000087221
Kind Code:
A
Abstract:

To diminish gas released from an MgO evaporating material used for vacuum deposition in a vacuum deposition apparatus and to shorten the time required to evacuate the vacuum deposition apparatus by pretreating the MgO evaporating material.

Gas in an MgO evaporating material used for vacuum deposition is released by a means such as acid washing, acid washing and vacuum heating or heating in the air before housing in a vacuum deposition apparatus. The time required to evacuate the vacuum deposition apparatus is shortened and the deterioration of the quality of a formed MgO film can be prevented.


Inventors:
HAKOMORI MUNEHITO
MATSUZAKI KANENORI
KURAUCHI TOSHIHARU
Application Number:
JP1998000274339
Publication Date:
March 28, 2000
Filing Date:
September 10, 1998
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
C23C14/24; (IPC1-7): C23C14/24
Attorney, Agent or Firm:
Shimizu Yoshi Hiro (1 person outside)