Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF MANUFACTURING PELLICLE FOR LITHOGRAPHY
Document Type and Number:
Japanese Patent JP2016114883
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a pellicle for lithography in which a damage given to a pellicle composed of a pellicle frame and a distortion given to a mask are small when pasting the pellicle to the mask.SOLUTION: In a method of manufacturing a pellicle composed of a pellicle frame having a flat adhesive layer formed on one end face, the pellicle is manufactured by preliminarily measuring a distortion of a mask when pasting the pellicle frame to the mask the surface of which is coated with a curable silicone composition through the adhesive layer, and by selecting only a pellicle frame whose mask distortion is within an allowable range. The allowable range of a mask distortion is less than 0.1 μm, preferably 0.05 μm or less.SELECTED DRAWING: None

Inventors:
SHIRASAKI SUSUMU
Application Number:
JP2014254983A
Publication Date:
June 23, 2016
Filing Date:
December 17, 2014
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F1/62; H01L21/027
Domestic Patent References:
JP2009058956A2009-03-19
JP2005352096A2005-12-22
JP2009058956A2009-03-19
JP2005352096A2005-12-22
JP2007025366A2007-02-01
Attorney, Agent or Firm:
Yukio Numazawa