Title:
METHOD OF OPTICALLY PRODUCING RELIEF STRUCTURE
Document Type and Number:
Japanese Patent JPS55155347
Kind Code:
A
Abstract:
The invention relates to a method for making more efficient the preparation of relief structures by phototechniques from mixtures containing acrylate- and/or methacrylate-group-containing polymers and photo-initiators. For this purpose, the invention provides the use of aromatic azides free of maleinimide groups as photo-initiators. The method according to the invention is suitable particularly for the structurization by phototechniques of insulating materials as well as of semiconductor and conductor materials.
Inventors:
ROORANTO RUBUNAA
EBAAHARUTO KIYUUN
HERUMUUTO AANE
EBAAHARUTO KIYUUN
HERUMUUTO AANE
Application Number:
JP6517480A
Publication Date:
December 03, 1980
Filing Date:
May 16, 1980
Export Citation:
Assignee:
SIEMENS AG
International Classes:
G03F7/00; G03F7/008; H01L21/027; G03F7/038; (IPC1-7): C08L77/00; G03C1/71; G03F7/08; H01L21/30
Domestic Patent References:
| JP44028725A | ||||
| JP42020126A |