Title:
METHOD FOR PRODUCING COMPLEX HAVING METAL FILM FORMED ON BASE MATERIAL, AND COMPLEX
Document Type and Number:
Japanese Patent JP2021025130
Kind Code:
A
Abstract:
To provide a method for forming a metal film having excellent peeling resistance on a base material conveniently, and a complex having the metal film on its surface.SOLUTION: A method for producing a complex having a metal film formed on a base material includes the step of: applying a metal chelate complex solution containing a metal component with smaller ionization tendency than that of Cd, and a chelator to the base material; and heating a portion of the base material to which the metal chelate complex solution has been applied. Preferably, the metal chelate complex solution further contains a surfactant, the base material is a cement hardened body, and the metal component is Cu or Ni.SELECTED DRAWING: Figure 1
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Inventors:
SAITO HIDETOSHI
KOMATSU KEIJI
DAN ENKIN
KUDO TAKUYA
GUO CHENYU
NANBU NOBUYOSHI
NAKAMURA ATSUSHI
NANBU TADAHIKO
KOMATSU KEIJI
DAN ENKIN
KUDO TAKUYA
GUO CHENYU
NANBU NOBUYOSHI
NAKAMURA ATSUSHI
NANBU TADAHIKO
Application Number:
JP2020131551A
Publication Date:
February 22, 2021
Filing Date:
August 03, 2020
Export Citation:
Assignee:
UNIV NAGAOKA TECHNOLOGY
CHUBU KIRESUTO KK
KIRESUTO KK
CHUBU KIRESUTO KK
KIRESUTO KK
International Classes:
C23C18/08; B05D3/02; B05D7/24; B32B13/06; C04B41/62; C04B41/69
Attorney, Agent or Firm:
Asfi International Patent Office