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Title:
METHOD FOR PRODUCING FLATTENING FILM, COMPOSITION FOR FORMING ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE FLATTENING FILM, FLATTENING FILM AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2019070676
Kind Code:
A
Abstract:
To provide a method for producing a flattening film capable of forming a flattening film excellent in flatness, a composition for forming an actinic ray-sensitive or radiation-sensitive flattening film, a flattening film, and a method for manufacturing an electronic device.SOLUTION: A method for producing a flattening film according to the present invention includes a step A of forming a film on a step substrate using a composition containing a resin (A) and a photoacid generator (B), a step B of exposing the film through a mask arranged at a position corresponding to the projection of the step substrate and a step C of removing the film provided on the projection of the step substrate using a developer to obtain a flattening film, where a value of γ of a test film obtained using the composition is less than 1,000.SELECTED DRAWING: Figure 8

Inventors:
KOSHIJIMA KOSUKE
YONEKUTA YASUTOMO
Application Number:
JP2016130972A
Publication Date:
May 09, 2019
Filing Date:
June 30, 2016
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G03F7/038; G03F7/004; G03F7/09; G03F7/20
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi