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Title:
METHOD FOR PRODUCING VAN DER WAALS HETERO STRUCTURE
Document Type and Number:
Japanese Patent JP2015231682
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a Van der Waals hetero structure where two-dimensional atomic thin film can be efficiently utilized, and further, a plurality kinds of two-dimensional atomic thin films can be laminated, thus a Van der Waals hetero structure can be easily and securely produced in a short time.SOLUTION: Provided is a method for producing a Van der Waals hetero structure comprising a process where a two-dimensional atomic thin film is formed on a first substrate, the fine drops of an adhesive resin are formed on a second substrate, the two-dimensional atomic thin film formed on the first substrate is successively transferred to the fine drops of the adhesive resin formed on the second substrate to laminate a plurality of the two-dimensional atomic thin films, the laminated plurality of the two-dimensional atomic thin films are transferred to the surface of a third substrate to produce a Van der Waals hereto structure on which the plurality of the two-dimensional atomic thin films are laminated is produced on the third substrate.

Inventors:
MASUBUCHI SATORU
MACHIDA YUKI
Application Number:
JP2014118916A
Publication Date:
December 24, 2015
Filing Date:
June 09, 2014
Export Citation:
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Assignee:
MASUBUCHI SATORU
MACHIDA YUKI
International Classes:
B32B37/00; B32B3/12; B32B3/16; B32B3/18; B32B9/00
Attorney, Agent or Firm:
青木 俊明
清水 守
川合 誠