METHOD FOR RADIATION GRAFT POLYMERIZATION - JAPAN ATOMIC ENERGY RES INST

Title:

METHOD FOR RADIATION GRAFT POLYMERIZATION

Document Type and Number:

Japanese Patent JP2002088132

Kind Code:

A

Abstract:

To provide a method for producing a clean functional material having excellent physical properties such as strength, etc., easily moldable and processable into a form for a use, having excellent heat resistance, a high economic effect and slight breading by a simple synthesis processes.

This method for a radiation graft polymerization is characterized in that an at least polymerizable monomer represented by a general formula (1), (2) or (3) (A is a 3-8C alkylene group or a 4-8C alkoxymethylene group; Z is a halogen atom or a hydroxy group; ring a, ring b and ring c may be each further substituted; R1, R2 and R3 are each independently a hydrogen atom, a 1-6C alkyl group or alkanol group; X is a counter ion of ammonium salt) is subjected to a graft polymerization by radiation on a polymer substrate.

Inventors:

SUGO TAKANOBU
ABE NOBORU
SHIRAISHI TOMOFUMI

Application Number:

JP2000276183A

Publication Date:

March 27, 2002

Filing Date:

September 12, 2000

Export Citation:

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Assignee:

JAPAN ATOMIC ENERGY RES INST
KANKYO JOKA GIJUTSU KENKYUSHO

International Classes:

C08J7/18; C08F291/00; D06M14/28; D06M15/233; (IPC1-7): C08F291/00; C08J7/18; D06M14/28; D06M15/233

Domestic Patent References:

JP2001038202A	2001-02-13
JP2000309609A	2000-11-07
JPS63135432A	1988-06-07
JPH0564726A	1993-03-19
JPH04349941A	1992-12-04
JPH0557200A	1993-03-09

Attorney, Agent or Firm:

Kazuo Shamoto (5 outside)

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