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Title:
METHOD FOR SEWING APPLIQUE
Document Type and Number:
Japanese Patent JP2010185151
Kind Code:
A
Abstract:

To provide a method for sewing an applique, in which when a pattern cloth part is arranged on a ground cloth without fault and sewed to the ground cloth, the circumference of the pattern cloth part is accurately held and the inside of an embroidery cloth is accurately sewed to the ground cloth.

A cutting needle for forming cuts is attached to an automatic embroidery machine and cuts are formed in a pattern cloth fitted to an embroidery frame. A fixed contour pattern is drawn, then the pattern cloth is piled on the ground cloth, both the cloths are supported by the embroidery frame, the inside of the fixed contour pattern is sewed to the ground cloth with a sewing yarn by the automatic embroidery machine, the pattern cloth part enclosed by the fixed contour pattern is integrated into the ground cloth and then the pattern cloth in the circumference of the pattern cloth part of the fixed contour pattern enclosed by the cuts of the pattern cloth is separated by the cuts and removed. The pattern cloth part of the fixed contour pattern is left on the ground cloth as pattern cloth pieces in a state in which the pattern cloth part is sewed to the ground cloth with the sewing yarn.


Inventors:
PAN KIM KWAN
Application Number:
JP2009030167A
Publication Date:
August 26, 2010
Filing Date:
February 12, 2009
Export Citation:
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Assignee:
BARUDAN CO LTD
International Classes:
D05C7/10; D05C17/00
Domestic Patent References:
JP2000008264A2000-01-11
JP2009011633A2009-01-22
Attorney, Agent or Firm:
Hiroshi Satake
Tomoko Nakajima