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Patent Searching and Data


Title:
MICROLENS
Document Type and Number:
Japanese Patent JP2009031399
Kind Code:
A
Abstract:

To provide a microlens comprising an array of unit lenses each having a rectangular feature in a plan view formed by a photolithographic step of applying a photosensitive resist on a substrate, exposing the photosensitive resist for patterning by use of a distributed density mask and developing, and to provide a microlens having improved condensing property of the rectangular lenses and efficiently irradiating a photodetector.

The distributed density mask has a slit pattern formed between lens patterns for forming unit lenses adjacent to each other. In each unit lens, the curvature of sphere close to the ends in a diagonal direction of the lens is equal to that of the center portion.


Inventors:
FUJITA KEI
ISHIMATSU TADASHI
Application Number:
JP2007193137A
Publication Date:
February 12, 2009
Filing Date:
July 25, 2007
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G02B3/00; G02B1/04; H01L31/10
Domestic Patent References:
JP2005352142A2005-12-22