PURPOSE: To prevent the contamination of susceptor due to H2O, Co, etc. and improve the quality of the crystal film, by installing the mechanism which mounts or dismounts the substrate to or from the susceptor in the vacuum vessel, taking out only the substrate into the air after crystal growth, and reserving the susceptor always in the vacuum vessel.
CONSTITUTION: The substrate equipted with the susceptor is delivered between the growth chamber 1 and the preliminary analysis chamber 2 by the manipulator 4'. The substrate after crystal growth is taken off from the susceptor 7' in the mounting/dismounting chamber 11, after being carried through the preliminary analysis chamber 2. Then the substrate only is pulled out from the load lock chamber 3 into the air. What is exposed to the air is only the substrate, and the susceptor 7' is always reserved in the vacuum, so that the susceptor does not suffer the contamination due to impure gases in the air like H2O, Co, etc. which give the crystal growth adverse effects, and the quality of the crystal growth film can be improved.
KANBARA HIDEAKI
UEDA SHINJIRO
TAKAHASHI KUNIHIRO
KANAI NORIO
