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Title:
NEW POLYMERIC ANTIMICROBIALS AND THEIR USE IN PHARMACEUTICAL COMPOSITION
Document Type and Number:
Japanese Patent JP3353423
Kind Code:
B2
Abstract:

PURPOSE: To provide a pharmaceutical composition which has specific spacer moieties and which has low toxicity and excellent antifungal properties, and also to provide a random polymer (salt) useful as an antimicrobial for use in cosmetics.
CONSTITUTION: A intended random copolymer, or a pharmaceutically allowable salt thereof, if provided. The random copolymer is represented by formula I [wherein n and m are, respectively, 1 to 10; o+p is z; z is 3 to 10,000; R1 and R2 are each a 1 to 5C alkyl; B is a 1 to 30C (substituted) alkyl; A is a 1 to 20C (substituted) alkyl, cycloalkyl, alkylenoxy or the like]. There is obtained a pharmaceutical composition having an antimicrobially effective amount of the random copolymer contained therein. The polymer is obtained, for example, by reaction between the compound of formula II and the polyethylenimine of formula III.


Inventors:
Joan Sub Park
Application Number:
JP29267993A
Publication Date:
December 03, 2002
Filing Date:
October 28, 1993
Export Citation:
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Assignee:
Archon Laboratories, Inc.
International Classes:
A01N33/04; A01N33/12; A61L2/16; A01N37/30; A01N43/04; A01N61/00; A61K8/81; A61K8/84; A61K31/785; A61L12/14; A61P31/02; A61P31/04; A61Q17/00; C07D207/46; C08F290/06; C08G73/02; C08G73/04; (IPC1-7): C08G73/04; A61K31/785
Domestic Patent References:
JP4913300A
JP5533411A
Other References:
【文献】米国特許5071934(US,A)
Attorney, Agent or Firm:
Shigeaki Nishikawa



 
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