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Title:
OXIDE SINTERED COMPACT, SPUTTERING TARGET, AND METHOD FOR PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JP2015127293
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an oxide sintered compact capable of preventing occurrence of crack in a bonding process, a sputtering target using the oxide sintered compact, and a method for production thereof.SOLUTION: The oxide sintered compact of the invention is obtained by sintering indium oxide, gallium oxide and tin oxide. The relative density and the average crystal grain size of the oxide sintered compact are 90% or higher and 10 μm or less, respectively. When defining the percentages (atom%) of the contents of indium, gallium and tin in all metallic elements included in the sintered compact as [In], [Ga] and [Sn], the compact satisfies in atom%, 30≤[In]≤50, 20≤[Ga]≤30 and 25≤[Sn]≤45, and an InGaOphase satisfies [InGaO]≥0.05.

Inventors:
TAO KOKI
HIROSE KENTA
JIKO NORIHIRO
OCHI MOTOTAKA
Application Number:
JP2014241480A
Publication Date:
July 09, 2015
Filing Date:
November 28, 2014
Export Citation:
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Assignee:
KOBELCO KAKEN KK
KOBE STEEL LTD
International Classes:
C04B35/00; C23C14/34
Attorney, Agent or Firm:
Ueki Kuichi
Ueki Hisahiko
Tadashi Sugawa
Hiroaki Ito
Akemi Takeoka