PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE

Title:

PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE

Document Type and Number:

Japanese Patent JP2013184382

Kind Code:

A

Abstract:

To form a pattern layer with excellent performance by shortening time until patterning of a support body having an application layer formed therein is performed by a plate, in a pattern formation technique for forming the pattern layer by patterning of the application layer supported by the support body such as a blanket by the plate.

After a plate is carried in to an upper stage portion (step S3), a blanket supporting an application layer is carried in to a lower stage portion (step S4). By using the plate, patterning of the application layer is performed so as to form a pattern layer. Before the blanket is carried in to the lower stage portion, the plate is carried in to the upper stage portion and sucked and held by a suction plate. Thus, immediately after the blanket is carried in, patterning processing (step S5) is started, so as to suppress passage of time from formation of the application layer until the patterning. As a result, the patterning processing can be performed successfully.

Inventors:

KAWAGOE MICHIFUMI
UENO HIROYUKI
NAKAJIMA MIKA
MASUICHI MIKIO

Application Number:

JP2012051210A

Publication Date:

September 19, 2013

Filing Date:

March 08, 2012

Export Citation:

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