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Patent Searching and Data


Title:
PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2013086313
Kind Code:
A
Abstract:

To reduce time necessary for forming a pattern by a heat cycle nanoimprint lithography.

A cured pattern is obtained by: applying a composition 30 for a nanoimprint which contains a curable silicon compound and an acid generator on a substrate 20 to form a film; generating an acid in the coating film by the irradiation with ultraviolet rays; pressing the film with a roller 50; heating the film to a temperature equal to or above the heat curable temperature of the silicon compound during the film is pressed by the roller 50; and removing the roller 50.


Inventors:
SHIMATANI SATOSHI
MAEDA MASATOSHI
TAKEUCHI HIROAKI
Application Number:
JP2011227444A
Publication Date:
May 13, 2013
Filing Date:
October 14, 2011
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
B29C59/02; B29C59/04; C08G77/04; H01L21/027
Domestic Patent References:
JP2011077353A2011-04-14
JP2010141064A2010-06-24
JP2009517310A2009-04-30
JP2005515617A2005-05-26
Attorney, Agent or Firm:
Sakaki Morishita
Takeshi Aoki