To provide a pattern-making system which is dynamic and rich in change.
This pattern-making system is characterized by comprising a reaction-diffusing chip 1 prepared by analogously accumulating diffusion devices 5 for simulating the diffusion of chemical substances on a silicon wafer, an external input means 8 for inputting stimulation 9 into a reaction-diffusing chip 1, and a digital equipment 10 for reading out a pattern 3 created on the basis of an electric potential distribution produced on the surface of the reaction-diffusing chip 1 with the stimulation taken in with the external input means 8 from the reaction-diffusing chip 1 and then preserving the pattern 3, and outputting the pattern 3 created with the reaction-diffusing chip 1 from the digital equipment 10.
AMAMIYA YOSHIHITO
TSUNABUCHI TERUYUKI
Next Patent: THERMAL DETERIORATION-PREVENTING POLYAMIDE FABRIC AND METHOD FOR PRODUCING THE SAME