To provide a patterning linear structure capable of improving electrical reliability of a conductive wiring and suppressing electro-chemical migration.

In a patterning conductive laminate: a circle 1 of which diameter is 70 μm in actual size is drawn on the center of an image obtained by randomly selecting and photographing a place in a conductive region of a patterning conducting layer; 18 straight lines passing through the center of the circle and equally dividing the circle 1 into 36 sectors are drawn; the number of intersecting points of the straight lines with linear structures 2 in the inside of the circle is counted for each of the straight lines; and when it is assumed that the straight line having the largest number of the intersecting points is l₀ and the straight line having an angle of 90 degrees with respect to l₀ is l₉₀, the intersecting number ratio n₀/n₉₀ which is a ratio of the number of intersecting points of l₀ n₀ to the number of intersecting points of l₉₀ n₉0 is larger than 1.2, and the absolute value of an angle between the pattern direction in which the conductive region of the patterning conducting layer extends and l₉₀ is smaller than 45 degrees.