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Title:
PHOTOMASK AND MANUFACTURE OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPH03153255
Kind Code:
A
Abstract:

PURPOSE: To reduce misdetection due to the influence of reflection on the internal wall of a pellicle frame when foreign matter is inspected by making the pellicle frame for mounting a pellicle on the photomask transparent to foreign matter detection light which is used for the foreign matter inspection on the pellicle surface or photomask surface.

CONSTITUTION: The pellicle 13 is made of a transparent thin film represented by nitrocelluose and fixed at a constant distance from a reticle 11 while covering and protecting a pattern part on the reticle 11. The pellicle frame 12 is made of transparent quartz glass and He-Ne laser light in the foreign matter inspection is easily transmitted. Thus, the pellicle frame 12 is transparent, so the He-Ne laser beam 14 in the foreign matter inspection is reflected by the chromium surface on the reticle 11 and transmitted almost without being reflected even when reaching the internal wall of the pellicle frame 12. Consequently, misinspection due to the influence of reflection on the pellicle frame internal wall at the time of the foreign matter inspection is reduced.


Inventors:
USHIYAMA FUMIAKI
Application Number:
JP29263389A
Publication Date:
July 01, 1991
Filing Date:
November 10, 1989
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G03F1/64; H01L21/027; (IPC1-7): G03F1/14; H01L21/027
Attorney, Agent or Firm:
Kisaburo Suzuki (1 outside)



 
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