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Patent Searching and Data


Title:
PHOTORESIST COMPOSITION FOR DEEP UV EXPOSURE AND REVERSAL IMAGE
Document Type and Number:
Japanese Patent JPH02154266
Kind Code:
A
Abstract:

PURPOSE: To obtain high resolution by incorporating a specified resin not crosslinked which is soluble or swellable with an alkali soln., a specified oximsulfonate and a specified crosslinking agent which enhances sensitivity for light.

CONSTITUTION: The compsn. contains an alkali-soluble or swellable resin not crosslinked in an amt. which is enough to bond each component of the compsn. to form a uniform film when the compsn. is applied, and an oximsulfonate which releases a sulfonic acid compd. when the compsn. is exposed to enough activation energy for image formation. Further, the compsn. contains a crosslinking agent which enhances the sensitivity for light in an enough amt. to crosslink the resin. The compsn. does not substantially contain an ethylene type unsatd. material which can be polymerized when radicals are released. Thereby, an image of high resolution can be obtd.


Inventors:
DAGURASU EE YUSHIFUAA
MAIKERU JII KERII
Application Number:
JP1989000255086
Publication Date:
June 13, 1990
Filing Date:
September 29, 1989
Export Citation:
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Assignee:
HOECHST CELANESE CORP
International Classes:
G03F7/038; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/038; G03F7/039; H01L21/027