Title:
PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME
Document Type and Number:
Japanese Patent JP3392546
Kind Code:
B2
Abstract:
PURPOSE: To obtain high sensitivity and high resolution to ultraviolet rays extremely short in wavelength, especially, ArF excimer laser beams by incorporating an alkali-soluble resin, a compound to be changed in solubility by an acid and a specified compound to be allowed to produce an acid by irradiation with chemical radiation.
CONSTITUTION: The photosensitive composition contains the alkali-soluble resin, the compound to be changed in solubility by an acid, and the compound to be allowed to produce an acid and selected from at least one of the compounds represented by formulae I-III in which A is a polycyclic aromatic ring having at least 5 conjugated double bonds; Z is a Cl or Br or the like atom; R1 is an H atom or a ≤6C hydrocarbon group or the like; B is an optionally substituted polycyclic aromatic ring having at least 5 conjugated double bonds or a cycloalkane or the like; X is CF3SO3, SbF6, BF4, or the like; each of R2 and R3 is, independently, an H or halogen atom or a nitro or cyano group or the like.
Inventors:
Kouji Asakawa
Toru Ushirokawachi
Takuya Naito
Naomi Shinoda
Makoto Nakase
Toru Ushirokawachi
Takuya Naito
Naomi Shinoda
Makoto Nakase
Application Number:
JP28180294A
Publication Date:
March 31, 2003
Filing Date:
November 16, 1994
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F7/004; C08F2/50; C08L101/00; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C08F2/50; C08L101/00; H01L21/027
Domestic Patent References:
| JP651519A | ||||
| JP5150454A | ||||
| JP5313371A | ||||
| JP8123031A | ||||
| JP6317907A |
Attorney, Agent or Firm:
Takehiko Suzue
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