PURPOSE: To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer consisting of N-alkoxyalkylated polyamide and cellulose ester as an org. covering layer and forming a photosensitive photoresist layer on the org. layer.

CONSTITUTION: A support is covered with an org. covering layer of a mixture of cellulose ester and N-alkoxyalkylated polyamide having alkoxydialkylation degree of about 10W40% and obtd. by heat reacting polyamide in a mixed solvent of alcohol and aldehydes in the presence of catalyst. The mixing ratio of the cellulose ester depends upon the kind of the ester. On the layer a photosensitive photoresist composition layer consisting mainly of an azide compound, and o-quinone azide compound and a diazo compound is formed to manufacture a photosensitive image forming material. The etchability and peelability of the org. layer disclosed after exposure and development are enhanced, and this material is suitable for use in manufacture of a process master for a photomechanical process.