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Patent Searching and Data


Title:
PHOTOSENSITIVE IMAGE FORMING MATERIAL
Document Type and Number:
Japanese Patent JPS55155348
Kind Code:
A
Abstract:

PURPOSE: To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer consisting of N-alkoxyalkylated polyamide and cellulose ester as an org. covering layer and forming a photosensitive photoresist layer on the org. layer.

CONSTITUTION: A support is covered with an org. covering layer of a mixture of cellulose ester and N-alkoxyalkylated polyamide having alkoxydialkylation degree of about 10W40% and obtd. by heat reacting polyamide in a mixed solvent of alcohol and aldehydes in the presence of catalyst. The mixing ratio of the cellulose ester depends upon the kind of the ester. On the layer a photosensitive photoresist composition layer consisting mainly of an azide compound, and o-quinone azide compound and a diazo compound is formed to manufacture a photosensitive image forming material. The etchability and peelability of the org. layer disclosed after exposure and development are enhanced, and this material is suitable for use in manufacture of a process master for a photomechanical process.


Inventors:
KUBO KEIJI
ISHIHARA TETSUO
Application Number:
JP1979000062934
Publication Date:
December 03, 1980
Filing Date:
May 21, 1979
Export Citation:
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Assignee:
DAICEL LTD
International Classes:
G03F7/09; G03C1/52; G03C1/72; G03F1/00; G03F7/105; G03F7/11; (IPC1-7): G03C1/52; G03C1/72; G03F1/00