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Title:
PHOTOSENSITIVE PHOSPHOR PASTE COMPOSITION
Document Type and Number:
Japanese Patent JPH04116558
Kind Code:
A
Abstract:

PURPOSE: To allow development by using water at the time of patterning of a film by forming a photopolymerizable initiator of 2-benzyl-2- dimethylamino-1-(4-morpholinophenyl)-butane-1-on.

CONSTITUTION: The photopolymn. initiator of the photosensitive phosphor paste compsn. formed by kneading an org. high-polymer binder, a photopolymerizable monomer, the photopolymn. initiator, phosphor poder, and an org. solvent is formed of the 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butane-1-on. The development by using water is possible in this way at the time of patterning the film capable of forming the fine patterns which are heretofore not obtainable with the conventional photosensitive phosphor paste compsn.


Inventors:
OGAWA EIICHI
AOYAMA TOSHIMI
Application Number:
JP1990000235668
Publication Date:
April 17, 1992
Filing Date:
September 07, 1990
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; G03F7/031; G03F7/032; H01J9/227; (IPC1-7): G03F7/004; G03F7/031
Domestic Patent References:
JPS5345180A1978-04-22
JPS5367751A1978-06-16
JPS58137834A1983-08-16
JPS58164677A1983-09-29
JP63284213U
JPH037772A1991-01-14
JPH037771A1991-01-14
JPH0420514A1992-01-24