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Title:
PHOTOSTABLE MATTER CONTAINING DIBENZOYLMETHANE-TYPE SUNSCREEN OBTAINED BY GEL-SOL PROCESS AND COSMETIC AND/OR DERMATOLOGICAL COMPOSITION CONTAINING THE MATTER
Document Type and Number:
Japanese Patent JP2004099601
Kind Code:
A
Abstract:

To provide a photostable dibenzoylmethane-type organic sunscreen.

A method for photostabilizing the sunscreen comprises immobilizing a filter of the dibenzoylmethane-type sunscreen in a matrix without using an organic solvent, wherein the matrix is produced from at least one silicon alkoxide, at least one nonionic surfactant, and water by a sol-gel process. Further, a method for producing matter containing the dibenzoylmethane-type organic sunscreen, the matter obtained by the method, and a cosmetic and/or a dermatological composition are provided, respectively.


Inventors:
CHODOROWSKI KIMES SANDRINE
Application Number:
JP2003199953A
Publication Date:
April 02, 2004
Filing Date:
July 22, 2003
Export Citation:
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Assignee:
OREAL
International Classes:
A61K8/30; A61K8/00; A61K8/02; A61K8/04; A61K8/06; A61K8/11; A61K8/31; A61K8/35; A61K8/36; A61K8/362; A61K8/365; A61K8/368; A61K8/37; A61K8/41; A61K8/49; A61K8/58; A61K8/89; A61K8/891; A61Q17/04; C08L83/04; C09K15/32; (IPC1-7): A61K7/00; A61K7/42; C09K15/32
Domestic Patent References:
JP2000154112A2000-06-06
JP2002516619A2002-06-04
JP2003520218A2003-07-02
JP2003500428A2003-01-07
JP2003525100A2003-08-26
JP2003510453A2003-03-18
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda