To provide a plane surface grinding device capable of flatly grinding a wafer by a required amount.
During grinding a wafer 10 wherein some kinds of material are laminated, through singular light transparent window WT provided on a platen 11, the amount of reflecting light from a ground surface of the wafer 10 is detected by a light detector 29 at the all time, and is detected by a plurality of light sensors Sn during a plurality of light transparent windows Wn passes through a bottom surface of the wafer 10. On the bases of the light amount, pressing force of plural pressurizing chambers provided on every ring- shaped areas within a head portion 14 is controlled, and pressing force on the wafer 10 is suitably set for each ring-shaped area to grind.
JP2000254849 | METHOD AND DEVICE FOR OPTICAL COPY GRINDING |
JP5751940 | Processing equipment |
WO/2021/035077 | POLISHING HEAD WITH MEMBRANE POSITION CONTROL |
FURUYAMA NAOHIRO
NAGAMOTO NOBUHIRO
SATO UICHI
MIHASHI MASANARI
NEC CORP
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