PURPOSE: To prevent generating of foreign matter in bus electrodes at the time of baking a dielectric layer covering display electrodes and penetrating of transparent electrodes into a dielectric layer by interposing an insulating film between the transparent electrodes constituting the display electrodes and the bus electrodes.
CONSTITUTION: An ITO layer is deposited on a transparent glass substrate 1 and is patterned to form the transparent electrodes 2 of prescribed shapes. The end edges of these transparent electrodes 2 are provided with the bus electrodes 3 of a small width having a three-layered structure composed of Cr/Cu/Cr. The display electrodes 4 consisting of both these electrodes is coated with the dielectric layer 5. This dielectric layer 5 is formed by screen printing low melting glass melted in an org. solvent, then firing the low melting glass at about 500 to 600°C. The insulating film 11 is interposed between the transparent electrodes 2 and the bus electrodes 3 of the plasma display panel constituted in the manner described above. A film of Si or a compd. film composed of a metallic element and O or N is adequate as this insulating film.