Title:
PLASMA PROCESSING EQUIPMENT AND ITS OPERATING METHOD
Document Type and Number:
Japanese Patent JPH08316286
Kind Code:
A
Abstract:
PURPOSE: To provide equipment capable of increasing the throughput of plasma processing.
CONSTITUTION: A plasma processing equipment is provided with a processing chamber 10 for surface-processing boards W by plasma discharge, load locking chambers 20R, 20L freely connectable with the processing chamber 10 through closable ports 11R, 11L formed in walls 10a forming this processing chamber 10, opening and closing means provided with doors 30 for closing the closable parts 11R, 11L from the internal surface side of the processing chamber 10 of the walls 10a, and a conveying means for conveying the board W between the processing chamber 10 and the load locking chamber 20R, 20L.
Inventors:
KOJIMA KENICHI
AYABE TOKIHIRO
SENOO TAKEHIKO
HAGA KISHICHI
SOEJIMA YUKIO
AYABE TOKIHIRO
SENOO TAKEHIKO
HAGA KISHICHI
SOEJIMA YUKIO
Application Number:
JP12011495A
Publication Date:
November 29, 1996
Filing Date:
May 18, 1995
Export Citation:
Assignee:
PLASMA SYSTEM
International Classes:
B29C37/00; C23C16/54; C23F4/00; H01L21/00; H01L21/02; H01L21/205; H01L21/302; H01L21/304; B01J19/08; H01L21/3065; H01L21/677; H05K3/08; H05K3/26; B29C59/14; (IPC1-7): H01L21/68; B01J19/08; C23F4/00; H01L21/02; H01L21/205; H01L21/3065; H01L21/304; H05K3/08; H05K3/26
Attorney, Agent or Firm:
Masatake Shiga (2 outside)
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