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Title:
PLASMA TREATMENT DEVICE, AND CLEANING METHOD OF PLASMA GENERATING ELECTRODE
Document Type and Number:
Japanese Patent JP2005285412
Kind Code:
A
Abstract:

To provide a plasma treatment device which can simplify the cleaning of a plasma generating electrode on which an overhaul and cleaning are applied by solving the problem that there is such a case that working load becomes large at the overhaul, and the overhaul is not recommendable when cleaning the plasma generating electrode, and simple sandblast treatment generates many scratches on the plasma generating electrode which causes arc discharge, and cleaning using a chemical agent damages the electrode material itself and is accompanied by a personal risk like a burn injury caused by a chemical agent.

On the plasma treatment device comprising a plasma generating electrode 1 having a vertical part at a peripheral part and a base material supporting body 4 facing each other, the gap between the plasma generating electrode 1 and the base material supporting body 4 is made variable.


Inventors:
KANETAKA TAKESHI
FUKUGAMI YOSHISUE
ISHII RYOJI
NAKAJIMA TAKAYUKI
SASAKI NOBORU
SUZUKI HIROSHI
Application Number:
JP2004094523A
Publication Date:
October 13, 2005
Filing Date:
March 29, 2004
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
H05H1/46; C23C14/56; C23C16/54; H01L21/3065; (IPC1-7): H05H1/46; C23C14/56; C23C16/54; H01L21/3065