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Patent Searching and Data


Title:
POLISHING COMPOSITION AND MAGNETIC DISK SUBSTRATE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2021054990
Kind Code:
A
Abstract:
To provide a polishing composition that is used in the polishing of an Ni-P substrate, and maintains a practical polishing rate, while having excellent scratch reduction performance.SOLUTION: There is provided a polishing composition used for the polishing of an Ni-P substrate. The polishing composition has a silica particle, an acid, an oxidizer, a defect reducing agent, and water. The polishing composition has an allylamine polymer as the defect reducing agent, with the content of the allylamine polymer being 10 ppm or less.SELECTED DRAWING: None

Inventors:
OYAMA TAKAHARU
Application Number:
JP2019180875A
Publication Date:
April 08, 2021
Filing Date:
September 30, 2019
Export Citation:
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Assignee:
FUJIMI INC
International Classes:
C09K3/14; B24B37/00; C09G1/02
Attorney, Agent or Firm:
Makoto Abe
Michiko Oi
Seiji Tani
Megumi Umehara