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Title:
POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2002103201
Kind Code:
A
Abstract:

To enhance a polishing quality of an object to be polished, by easily and surely remove a fallen dressing member, abrasive liquid, and polishing powder which are on a polishing surface and cause a scratch.

This polishing device comprises a polishing table 11 having the polishing surface, and a dresser 33 which carries out dressing of the polishing surface, and presses the object W to be polished thereby polishing it. In a lower surface of the dresser 33, the dressing member 34 for carrying out the dressing of the polishing surface by being in sliding contact with the polishing surface, and an injection nozzle 35 for injecting to the polishing surface of the polishing table 11 a liquid in which a cleaning liquid supplied from a liquid supply source 50 and a gas supplied from a gas supply source 40 are mixed are provided.


Inventors:
TORII HIROOMI
AIZAWA HIDEO
ISOBE SOICHI
Application Number:
JP2000000294666
Publication Date:
April 09, 2002
Filing Date:
September 27, 2000
Export Citation:
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Assignee:
EBARA CORP
International Classes:
B24B37/04; B24B53/013; B24B53/017; B24B53/02; B24B53/12; B24B55/02; B24B55/06; H01L21/304; (IPC1-7): B24B37/00; B24B53/02; B24B55/02; B24B55/06; H01L21/304
Attorney, Agent or Firm:
Isamu Watanabe (1 person outside)



 
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