To provide a polysiloxane resin composition that gives a smooth coating film and is particularly suitable for forming an insulating film, a protective film or a flattening film on a TFT element or a semiconductor element, and to provide a display device and a semiconductor device using the composition.

The polysiloxane resin composition comprises a polysiloxane resin (A), an organic solvent (B), and a fluorine-based surfactant (C). The surfactant (C) having a fluorine atom is a block copolymer including a polymerization segment (M1) comprising a polymerizable monomer (m1) having a fluorinated alkyl group having 1 to 6 carbon atoms and an ethylenic double bond, and a polymerization segment (M2) of monomers including a polymerizable monomer (m2) having an alkylene oxy group and an ethylenic double bond. The display device has a cured film formed by using the above composition on a TFT element. The semiconductor device includes a cured film formed by using the composition on a semiconductor element.