Title:
ポジ型レジスト組成物
Document Type and Number:
Japanese Patent JP5577572
Kind Code:
B2
Abstract:
Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.
Inventors:
Yoshimi Isono
ジョドリ Jonathan Joaquim
Satoshi Narizuka
Kazuhiro Yamanaka
ジョドリ Jonathan Joaquim
Satoshi Narizuka
Kazuhiro Yamanaka
Application Number:
JP2008221694A
Publication Date:
August 27, 2014
Filing Date:
August 29, 2008
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
C08F216/14; C08F212/04; C08F232/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Makoto Koide