PURPOSE: To stably hold an amorphous film to org. matter, for which to stable glassy amorphous means is not obtainable, by providing a protective layer on a vapor deposited film obtd. at the time of formation of the amorphous film by a vacuum vapor deposition method.

CONSTITUTION: The protective layer is provided on the vapor deposited film obtd. in the method for forming the amorphous thin film by the vacuum vapor deposition method. The protective layer may be formed after the amorphous thin film is once returned to the atm. from the inside of a vacuum or may be formed as it is in the vacuum at the time of formation of the protective layer. The protective layer is preferably formed while the vacuum is maintained in the case of the thin film which generates crystal grains when exposed into the air. The vacuum vapor deposition is preferably executed while the material under vapor deposition is irradiated with light. Further, the protective layer is preferably consisted of a material which does not allow the permeation of the moisture in the air. The amorphous state is stably protected in this way.