Title:
PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5376766
Kind Code:
A
Abstract:
PURPOSE: To prevent side-etching and over-etchng at the time of windowing of contact regions by a wash method by beforehand providing a stopper layer which is not eroded by an etching solution for SiO2 on the contact regions.
Inventors:
TSUNAKO JIYUUKICHI
UENISHI KATSUZOU
UENISHI KATSUZOU
Application Number:
JP15211476A
Publication Date:
July 07, 1978
Filing Date:
December 20, 1976
Export Citation:
Assignee:
OKI ELECTRIC IND CO LTD
International Classes:
H01L29/73; H01L21/283; H01L21/331; H01L29/72; (IPC1-7): H01L21/283; H01L29/72
Domestic Patent References:
| JPS485629A | ||||
| JPS4871972A | 1973-09-28 |