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Title:
PROJECTION OPTICAL SYSTEM, AND DEVICE AND METHOD OF EXPOSURE
Document Type and Number:
Japanese Patent JP2005003982
Kind Code:
A
Abstract:

To provide a projection optical system in which a large numerical aperture on image side necessary for a sufficiently large image field and a high resolution is secured while suppressing the increase in the number of lens elements and the enlargement of lens.

The system is provided with a first image formation optical system (G1) for forming an intermediate image of a first object (R) and second image formation optical system (G2) for forming a final image of the first object on a second object (W) on the basis of the light coming from the intermediate image. The first image formation optical system is a catadioptric type optical system including a concave reflection surface, and the second image formation optical system is a refraction type optical system having a positive refractive power as a whole. The optical path between the optical plane closest to the second image formation optical system and the second object is filled with a liquid having a refractive index substantially larger than 1 (water, for example).


Inventors:
YAMAGUCHI KOTARO
Application Number:
JP2003000168036
Publication Date:
January 06, 2005
Filing Date:
June 12, 2003
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G02B13/24; G02B13/18; G02B17/08; G03F7/20; H01L21/027; (IPC1-7): G02B13/24; G02B13/18; G02B17/08; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Takao Yamaguchi