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Patent Searching and Data


Title:
PROJECTIVE EXPOSURE METHOD AND DEVICE
Document Type and Number:
Japanese Patent JPH07244199
Kind Code:
A
Abstract:

PURPOSE: To provide a method and a device for projective exposure which can maintain a high exposure strength and a high resolution and control the decease of throughputs, avoiding the degradation of exposure strength possibly even when a reflection-type mask with different reflective characteristics is used.

CONSTITUTION: When a pattern of a reflection type masks 12 is transcribed on a substrate 10 by an optical imaging system equipped with a concave mirror 11a and a convex mirror 1b in a projective exposure method, a reflecting mirror 13 for controlling incidence angles is installed in either or both of the place between the mask 12 and a light source 19 and that between the mask 12 and the optical imaging system. When the reflective characteristics of the mask 12 change into those of a mask 14, an incidence angle is adjusted to maximize projective exposure strength on the substrate by leaning (turning) the mask 14 in the direction of the arrow shown in the diagram. In order to always keep the position and direction of beams of the optical imaging system to the adjusted incidence angle, it is compensated by shifting the reflecting mirror 13 for controlling incidence angles to the position 17.


Inventors:
YAMANASHI HIROMASA
ITO MASAAKI
TAKEDA EIJI
MATSUZAKA TAKASHI
Application Number:
JP3254494A
Publication Date:
September 19, 1995
Filing Date:
March 02, 1994
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G21K1/06; G03B27/54; G03F7/20; H01L21/027; (IPC1-7): G21K1/06; G03B27/54; H01L21/027
Attorney, Agent or Firm:
Toshiyuki Usuda