RADIATION RAYS SENSITIVE RESIN COMPOSITION

Japanese Patent JP3772335

B2

PROBLEM TO BE SOLVED: To form a pattern with the excellent sensitivity, and to stably form a pattern with the excellent reality and faithful in relation to the reticule dimension by including the specified copolymer and the radiation rays sensitive acid generating agent. SOLUTION: This composition includes the copolymer, which is practically formed of a repeat unit expressed with formula I and a repeat unit expressed with formula II (copolymer A), and the radial rays sensitive acid generating agent. In the copolymer A, the repeat units (formulas I, II) is occupied with the repeat unit (formula I) at 0.05-0.9 mole per 1 mole as a total of the repeat unit (formulas I, II), and the copolymer A is occupied with the low molecular component, of which polystyrene conversion molecular weight is 500 or less, less than 2% of the area of the gel permeation chromatograph. In the formula, R1 and R2 mean hydrogen atom or alkyl group having 1-8 of carbon, and R3 and R4 mean hydrogen atom or alkyl group having 1-8 of carbon, and (n) means the numeric 1 or 2. In the formula, R5 means hydrogen atom or alkyl group having 1-8 of carbon.