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Patent Searching and Data


Title:
RADIATION RAYS SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3772335
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form a pattern with the excellent sensitivity, and to stably form a pattern with the excellent reality and faithful in relation to the reticule dimension by including the specified copolymer and the radiation rays sensitive acid generating agent. SOLUTION: This composition includes the copolymer, which is practically formed of a repeat unit expressed with formula I and a repeat unit expressed with formula II (copolymer A), and the radial rays sensitive acid generating agent. In the copolymer A, the repeat units (formulas I, II) is occupied with the repeat unit (formula I) at 0.05-0.9 mole per 1 mole as a total of the repeat unit (formulas I, II), and the copolymer A is occupied with the low molecular component, of which polystyrene conversion molecular weight is 500 or less, less than 2% of the area of the gel permeation chromatograph. In the formula, R1 and R2 mean hydrogen atom or alkyl group having 1-8 of carbon, and R3 and R4 mean hydrogen atom or alkyl group having 1-8 of carbon, and (n) means the numeric 1 or 2. In the formula, R5 means hydrogen atom or alkyl group having 1-8 of carbon.

Inventors:
田辺 隆喜
夏目 紀浩
山近 幹雄
辻 昭
Application Number:
JP870896A
Publication Date:
May 10, 2006
Filing Date:
January 22, 1996
Export Citation:
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Assignee:
JSR株式会社
International Classes:
G03F7/004; G03F7/039; G03F7/033; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; G03F7/033; H01L21/027
Domestic Patent References:
JP7333851A
JP7128858A
JP7128852A
JP7230169A
JP7209868A
JP6093045A
JP7134419A
JP7261377A
JP9068795A
Attorney, Agent or Firm:
大島 正孝