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Patent Searching and Data


Title:
RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS5989309
Kind Code:
A
Abstract:

PURPOSE: A resin composition being applied to release paper, irradiated with active light rays, adhered to pottery, and calcined to give an improved picture pattern, containing benzyl acrylate, a polymer soluble in benzyl acrylate, and a photosensitive catalyst.

CONSTITUTION: The desired composition consisting of (A) preferably 30W90wt% benzyl acrylate, (B) preferably 5W60wt% a polymer [e.g., (co)polymer of styrene, methyl methacrylate, butadiene, acrylonitrile, etc.] soluble in benzyl acrylate, and (C) preferably 0.2W20wt% photosensitive catalyst (e.g., 2-ethylanthraquinone, etc.). For example, a picture pattern is made on release paper, the resin composition is applied to the pattern, irradiated with active energy rays such as electron rays, γ-rays, etc. The released thin film having the picture pattern is stuck fast to the surface of pottery, etc., and calcined, to form china-painting.


Inventors:
HASHIMOTO MATSUO
OZONO MASAYOSHI
Application Number:
JP19889982A
Publication Date:
May 23, 1984
Filing Date:
November 15, 1982
Export Citation:
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Assignee:
NIPPON KAYAKU KK
THREE BOND CO LTD
International Classes:
B44C1/16; B41M3/12; B44C1/165; C04B41/83; C08F2/00; C08F2/44; C08F2/48; C08F20/00; C08F20/10; C08F20/18; C08F291/00; (IPC1-7): B41M3/12; C04B41/06; C08F2/44; C08F2/48; C08F20/18; C08F291/00; G03C1/68; G03C5/24