PURPOSE: To obviate the generation of linear defects in an abnormal longitudinal direction even in severe environment affected by strong vibrations and impact by forming a mechanically secure insulating film on the inside surface of the common transparent electrode of a substrate so as to evade points to be formed as pixels for display.
CONSTITUTION: Patterns of black matrix films BM which prevent the exposure of thin-film transistors TFTs to external light and the consequent conducting thereof and help to improve the contrast by suppressing the reflection of the external light, color filters FILs, etc., are formed on the inside surface (liquid crystal side) of an upper transparent glass substrate SUB2. The surfaces thereof are coated with a protective film PSV2 and further, the common transparent electrode ITO2 (COM) covers thereon over the entire surface. Further, the mechanically secure insulating film PSV3, for example, a silicon nitride film, is formed on the inside surface of the common electrode ITO2 (COM) by evading the points to be formed as the pixels for display. As a result, the front ends of conductive foreign matter are blocked by the PSV3 and cannot come into contact with the common transparent electrode ITO2(COM) any more.