Title:
SAPPHIRE SUBSTRATE AND METHOD FOR POLISHING THE SAME
Document Type and Number:
Japanese Patent JP2016047578
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a sapphire substrate which does not cause occurrence of a fine scratch on a surface of a substrate, has high flatness, and has no appearance abnormality such as rubbing and flaws; and a method for polishing the same.SOLUTION: There is provided a method for polishing a sapphire substrate or the like which polishes one surface of the surface of a sapphire substrate with a polishing material. The method includes applying wax onto a non-polished surface of the substrate, and coating the substrate so that a thickness is 1 μm or more, and then bringing water into contact with the non-polished surface of the substrate and making the non-polished surface attached to a polishing block.SELECTED DRAWING: Figure 1
Inventors:
NAKAMURA TAKUMA
AOKI KATSUTOSHI
AOKI KATSUTOSHI
Application Number:
JP2014173486A
Publication Date:
April 07, 2016
Filing Date:
August 28, 2014
Export Citation:
Assignee:
SUMITOMO METAL MINING CO
International Classes:
B24B37/30; B24B1/00; B24B37/00; B24B41/06
Attorney, Agent or Firm:
Kazuya Nishi
Usami Aya
Usami Aya
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