Title:
Sedimentary source with adjustable electrodes
Document Type and Number:
Japanese Patent JP6297597
Kind Code:
B2
Abstract:
An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.
Inventors:
Bushbeck, Wolfgang
Reese, Florian
Stray, Tobias
Reese, Florian
Stray, Tobias
Application Number:
JP2015555681A
Publication Date:
March 20, 2018
Filing Date:
January 28, 2014
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C16/52; C23C14/52; C23C14/54; C23C14/56; C23C16/50; C23C16/54; H01L21/203; H01L21/205; H05H1/46
Domestic Patent References:
| JP9228054A | ||||
| JP2008031521A | ||||
| JP2006299361A | ||||
| JP2010258422A |
Foreign References:
| WO2011105898A1 | ||||
| WO2010052846A1 | ||||
| WO2006093168A1 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation