SEMICONDUCTOR PROCESSING CHAMBER IMPROVING FLOW OF PRECURSOR

Japanese Patent JP2023025029

A

To provide a semiconductor system, a process and an apparatus for delivering precursors in a chamber.SOLUTION: In a processing system 400, an adapter 415 coupled to a remote plasma unit 410 includes a first end portion 411, and a second end portion 412 on an opposite side to the first end portion. The adapter defines an opening portion to a central channel 413 at the first end portion. The central channel is characterized by a first cross-sectional area in a direction perpendicular to a central axis passing through the adapter. The adapter defines an outlet from a second channel 416 at the second end portion, defines a transition portion 414 between the central channel and the second channel within the adapter between the first end portion and the second end portion, and defines a third channel 418 between the transition portion and the second end portion of the adapter. The third channel is fluidly separated from the central channel and the second channel.SELECTED DRAWING: Figure 4

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Tan, Tien Fak
Lubomirsky, Dmitry
Chung, Sunuk
Park, Sunam
Lou, Raymond W.
femme, von
Suarez, Edwin Sea.

JP2022180220A

February 21, 2023

November 10, 2022

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APPLIED MATERIALS,INCORPORATED

H01L21/3065; C23C16/455; H01L21/31

JP2002057114A	2002-02-22
JP2011527840A	2011-11-04
JP2003133288A	2003-05-09
JP2006245533A	2006-09-14

US20140248780A1	2014-09-04
US20160086807A1	2016-03-24

Sonoda & Kobayashi Patent Attorneys Corporation

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